Does p-type ohmic contact exist in WSe2-metal interfaces?

نویسندگان

  • Yangyang Wang
  • Ruo Xi Yang
  • Ruge Quhe
  • Hongxia Zhong
  • Linxiao Cong
  • Meng Ye
  • Zeyuan Ni
  • Zhigang Song
  • Jinbo Yang
  • Junjie Shi
  • Ju Li
  • Jing Lu
چکیده

Formation of low-resistance metal contacts is the biggest challenge that masks the intrinsic exceptional electronic properties of two dimensional WSe2 devices. We present the first comparative study of the interfacial properties between monolayer/bilayer (ML/BL) WSe2 and Sc, Al, Ag, Au, Pd, and Pt contacts by using ab initio energy band calculations with inclusion of the spin-orbital coupling (SOC) effects and quantum transport simulations. The interlayer coupling tends to reduce both the electron and hole Schottky barrier heights (SBHs) and alters the polarity for the WSe2-Au contact, while the SOC chiefly reduces the hole SBH. In the absence of the SOC, the Pd contact has the smallest hole SBH. Dramatically, the Pt contact surpasses the Pd contact and becomes the p-type ohmic or quasi-ohmic contact with inclusion of the SOC. Therefore, p-type ohmic or quasi-ohmic contact exists in WSe2-metal interfaces. Our study provides a theoretical foundation for the selection of favorable metal electrodes in ML/BL WSe2 devices.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Role of metal contacts in designing high-performance monolayer n-type WSe2 field effect transistors.

This work presents a systematic study toward the design and first demonstration of high-performance n-type monolayer tungsten diselenide (WSe2) field effect transistors (FET) by selecting the contact metal based on understanding the physics of contact between metal and monolayer WSe2. Device measurements supported by ab initio density functional theory (DFT) calculations indicate that the d-orb...

متن کامل

Engineering Efficient p-Type TMD/Metal Contacts Using Fluorographene as a Buffer Layer

DOI: 10.1002/aelm.201600318 structurally stable and largely lack dangling bonds. The production processes of TMDs are currently well established, ranging from top-down exfoliation of the bulk material using mechanical exfoliation, solution-based approaches and the bottom-up synthesis methods using chemical vapor deposition.[7,8] TMDs have gained significant importance as excellent candidates fo...

متن کامل

Metal-Semiconductor Barrier Modulation for High Photoresponse in Transition Metal Dichalcogenide Field Effect Transistors

A gate-controlled metal-semiconductor barrier modulation and its effect on carrier transport were investigated in two-dimensional (2D) transition metal dichalcogenide (TMDC) field effect transistors (FETs). A strong photoresponse was observed in both unipolar MoS2 and ambipolar WSe2 FETs (i) at the high drain voltage due to a high electric field along the channel for separating photo-excited ch...

متن کامل

Computational Study of Metal Contacts to Monolayer Transition-Metal Dichalcogenide Semiconductors

Among various 2D materials, monolayer transition-metal dichalcogenide (mTMD) semiconductors with intrinsic band gaps (1–2 eV) are considered promising candidates for channel materials in next-generation transistors. Low-resistance metal contacts to mTMDs are crucial because currently they limit mTMD device performances. Hence, a comprehensive understanding of the atomistic nature of metal conta...

متن کامل

Optimizing Charge Injection across Transition Metal Dichalcogenide Heterojunctions: Theory and Experiment.

In search of an improved strategy to form low-resistance contacts to semiconducting transition metal dichalcogenides, we combine ab initio density functional electronic structure calculations for an NbSe2/WSe2 interface with quantum transport measurements of the corresponding heterojunction between a few-layer WSe2 semiconductor and a metallic NbSe2 layer. Our theoretical results suggest that, ...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:
  • Nanoscale

دوره 8 2  شماره 

صفحات  -

تاریخ انتشار 2016